VB6 UHR EWF electron beam lithography tool at James Watt Nanofabrication Centre, University of Glasgow


w: http://www.jwnc.gla.ac.uk/electronbeamlithography.html

Maximum substrate / wafer size of 200 mm. Gaussian beam step and exposure writing strategy. Thermal field emission gun with 50 keV and 100 keV operation. Minimum spot size <; 4 nm. Demonstrated single lines down to <; 5 nm using HSQ resist. 0.46 nm rms layer-to-layer alignment. Extra wide field of 1.3 mm at both 50 and 100 keV. Laser interferometer stage with 0.62 nm resolution. 50 MHz pattern generator. Full automated alignment. Multi-substrate load lock - we run up to 4000 hours of pattern writing per annum

Hosted by: James Watt Nanofabrication Centre, University of Glasgow.

Manufacturer: Vistec.

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