Suss Microtec MA6 at James Watt Nanofabrication Centre, University of Glasgow


w: http://www.jwnc.gla.ac.uk/opticallithography.html

Maximum substrate size of 150 mm. For samples below 75 mm: hard and vacuum contact modes. For samples of 100 mm and above: proximity, hard and vacuum contact modes. Top and back side alignment. 350 W Hg lamp. UV400 optics and i-line filters. Motorised stage and focus. Exposure controller for single or multiple exposures. Chucks for bond alignment and silicon fusion applications.

Hosted by: James Watt Nanofabrication Centre, University of Glasgow.

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