PlasmaPro System 100 ICP180 RIE at James Watt Nanofabrication Centre, University of Glasgow


w: http://www.jwnc.gla.ac.uk/etch.html

These are load locked RIE tools with cooled / heated stages and viewing ports with interferometers to monitor the etch depth. A ICP source is used for high density plamas for deep etching of semiconductor materials. Gases: Cl2, BCl3, HBr, SiCl4, CH4, CF4, O2, N2, Ar, O2, low flow O2, H2. Materials etched: III-V etching, GaAs, AlGaAs, InGaAs, InP, GaN, AlGaN, high-K, low damage nitride, Au, Pt, Pd, Al, Ti

Hosted by: James Watt Nanofabrication Centre, University of Glasgow.

Manufacturer: Oxford Instruments.

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