OPT Plasmalab 400 Sputtering Machine at Optoelectronics Research Centre, University of Southampton


w: http://www.orc.soton.ac.uk/integratedcleanroom.html

Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films.

Hosted by: Optoelectronics Research Centre, University of Southampton.

Contact: Ea07ce06300705be4690971cf0e3a3de5eb26e95.

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