OPT Plasmalab 400 Sputtering Machine at Centre for Innovative Manufacturing in Photonics, University of Southampton


w: http://www.cimp.soton.ac.uk/integrated.html

Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films.

Hosted by: Centre for Innovative Manufacturing in Photonics, University of Southampton.

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