Karl-Suss A6 double-sided mask aligner at Optoelectronics Research Centre, University of Southampton


w: http://www.orc.soton.ac.uk/integratedcleanroom.html

Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer

Hosted by: Optoelectronics Research Centre, University of Southampton.

Contact: Ea07ce06300705be4690971cf0e3a3de5eb26e95.

Manufacturer: Karl-Suss.

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