Ionfab 300 Plus Reactive Ion Beam Deposit/Etcher at Optoelectronics Research Centre, University of Southampton


w: http://www.orc.soton.ac.uk/integratedcleanroom.html

Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target.

Hosted by: Optoelectronics Research Centre, University of Southampton.

Contact: Ea07ce06300705be4690971cf0e3a3de5eb26e95.

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