Ionfab 300 Plus Reactive Ion Beam Deposit/Etcher at Centre for Innovative Manufacturing in Photonics, University of Southampton


w: http://www.cimp.soton.ac.uk/integrated.html

Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target.

Hosted by: Centre for Innovative Manufacturing in Photonics, University of Southampton.

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