FEI Helios NanoLab DualBeam FIB/SEM at Optoelectronics Research Centre, University of Southampton

w: http://www.orc.soton.ac.uk/599.html

Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. Specifications: 0.9 nm electron beam and 5 nm ion; beam resolution; Gas injection for beam-induced deposition; of gold and platinum; Nabity pattern generator; Electron-beam lithography capability; Kleindiek nanomanipulator for TEM sample; lift-out (other tool options available inc. microfluidic; injection and four-point electrical probe); 5-axis motorized stage for samples up to 150mm dia (larger without full rotation) and 20 mm thick; Ability to accept complex CAD pattern files.

Hosted by: Optoelectronics Research Centre, University of Southampton.

view sources