We have developed a fabrication methodology for producing large area patterned thin-film structures using the e-beam facility described above. The fabrication technique is based on polystyrene nanosphere self-assembly which is performed on water interface and then transferred onto thin film surfaces. The fabrication steps include reactive ion etching and thin film milling which are performed by a PlasmaPod system (JLS_ Design) . The system is fully automated and can operate using a combination of etching gases.
Hosted by: Physics and Astronomy, University of Exeter.