EBPG5 HR 100 electron beam lithography tool at James Watt Nanofabrication Centre, University of Glasgow


w: http://www.jwnc.gla.ac.uk/electronbeamlithography.html

Maximum substrate / wafer size of 150 mm. Gaussian beam step and exposure writing strategy. LaB6 filament and 20 keV, 50 keV and 100 keV operation. 10 MHz pattern generator. Writing field sizes of 560 x 560 'm at 100 keV and 800 x 800 'm at 50 keV. Laser interferometer stage with 5 nm resolution. Multi-substrate load lock

Hosted by: James Watt Nanofabrication Centre, University of Glasgow.

Manufacturer: Vistec.

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