AVT PEO 610 Oxidation Furnace at James Watt Nanofabrication Centre, University of Glasgow


w: http://www.jwnc.gla.ac.uk/thermal.html

The AVT PEO 601 oxidation furnace has the ability to grow thermal SiO2 and SiOxN1-x up to 1100 oC at ramp rates up to 100 oC/min for a wafer batch or 20 oC/s for single wafers. The system can take 25 off 100 mm diameter wafers. Gases include O2, N2O, N2 and forming gas.

Hosted by: James Watt Nanofabrication Centre, University of Glasgow.

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