Glasgow has two commercial Vistec VB6 and EPBG5 electron beam lithography tools, 30 years experience of electron beam lithography and holds world records for the smallest wire fabricated by electron beam lithography (3 nm width) and the best layer-to-layer alignment of any technique (0.46 nm rms).
The James Watt Nanofabrication Centre is one of the few places in the world with sub-10 nm single line capability and the appropriate dry etch and metal deposition processes to allow sub-10 nm features to be fabricated and integrated into devices.
We have sub-5 nm capability for single line lithography and have signficant experience of a variety of resist including polymethylmethacrylate (PMMA), hydrogen silsesquioxane (HSQ), ZEP, UVIII and NEB.
Both tools have laser interferometry stage position measurement allowing stitching of fields with sub-1 nm precision using proprietary techniques and the VB6 has an ultra-wide 1.3 mm field. We have a number of proprietary techniques to allow small features to be produced and significant experience of minimising tilt, stitching errors and proximity effects in designs.
Access to the tools can be achieved through collaborative projects (e.g. EPSRC and EC), the EPSRC III-V National Facility and commercially through Kelvin Nanotechnology Ltd..